Porous Silicon Etching Equipment

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In collaboration with Semsysco, standard tools or customized etching equipment is available to match all needs.
SEMSYSCO GmbH
- Semi- Automated Pilot Line

  • From lab tools to high-volume production
  • 100% porous silicon coverage with zero edge exclusion
  • Optimum Uniformity
  • 5% layer thickness
  • 5% pore size variation
  • Current density upto 400mA/cm2
  • Chemistry temperature control 10-30°C
  • Compatible  with a range of electrolytes: e.g. HF/IPA, HF/ethanol, HF/DMF               

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